Publication:

Roadblocks and critical aspects for sub 45 nm wafer cleaning and possible solutions

Date

2008
Proceedings Paper
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17845.pdf 350.68 KB

Author(s)

Mertens, Paul  
;
Vos, Rita  
;
Vereecke, Guy  
;
Janssens, Tom
;
Wostyn, Kurt  
;
Claes, Martine  
;
Kesters, Els  
;
Le, Quoc Toan  
;
Halder, Sandip  
;
Hoyer, Ronald
;
Andreas, Michael
;
Kim, Kyung Hyun
;
Barbagini, Francesca
;
Zijlstra, Aaldert
;
Holsteyns, Frank  
;
Kim, Tae-Gon
;
Kenis, Karine
;
Arnauts, Sophia
;
Lux, Marcel
;
Bearda, Twan
;
Heyns, Marc

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Abstract

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