Publication:

Full field EUV lithography: lessons learnt on EUV ADT imaging, EUV resist, and EUV reticles

Date

2008

Proceedings Paper

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Files

17434.pdf 582.67 KB

Author(s)

Hendrickx, Eric

;

Goethals, Mieke

;

Niroomand, Ardavan

;

Jonckheere, Rik

;

Van Roey, Frieda

;

;

;

Baudemprez, Bart

;

Statistics

1998 since deposited on 2021-10-17

Acq. date: 2026-05-30