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Atomic layer deposition of ruthenium at 100°C using the RuO4-precursor and H2
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1969 since deposited on 2021-10-22
6last month
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Acq. date: 2026-10-13
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Statistics
Views
1969 since deposited on 2021-10-22
6last month
3last week
Acq. date: 2026-10-13
Citations