Publication:

High yield and process uniformity for 300 mm integrated WS2 FETs

Date

2021
Meeting abstract
Simple item page Full metadata Statistics
Loading...
Thumbnail Image

Files

Published version 885.9 KB

Author(s)

Schram, Tom  
;
Smets, Quentin  
;
Radisic, Dunja  
;
Groven, Benjamin  
;
Thiam, Arame  
;
Li, Waikin  
;
Dupuy, Emmanuel  
;
Vandersmissen, Kevin  
;
Maurice, Thibaut  
;
Asselberghs, Inge  
;
Radu, Iuliana  

Journal

NA

Abstract

Description

Statistics

Downloads

1603 since deposited on 2021-11-19
43last month
17last week
Acq. date: 2026-10-13

Views

1800 since deposited on 2021-11-19
9last month
2last week
Acq. date: 2026-10-13

Citations

Statistics

Downloads

1603 since deposited on 2021-11-19
43last month
17last week
Acq. date: 2026-10-13

Views

1800 since deposited on 2021-11-19
9last month
2last week
Acq. date: 2026-10-13

Citations