Publication:

Integration of 20nm half pitch single damascene copper trenches by spacer-defined double patterning (SDDP) on metal hard mask (MHM)

Date

2010

Proceedings Paper

Simple item page Full metadata Statistics

Author(s)

Siew, Yong Kong

;

Versluijs, Janko

;

;

;

Alaerts, Wilfried

;

Dekkers, Harold

;

;

;

Cockburn, Andrew

;

;

Van Besien, Els

;

Struyf, Herbert

;

Maenhoudt, Mireille

;

;

;

;

Gravey, Virginie

;

Statistics

2189 since deposited on 2021-10-18

2last month

Acq. date: 2026-05-30