Publication:

Processing Stability of Monolayer WS2 on SiO2

Date

2021

Journal article

https://doi.org/10.1088/2632-959x/ac022b

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Files

Published version 1.12 MB

Author(s)

;

;

Asselberghs, Inge

;

Huyghebaert, Cedric

;

;

Banerjee, Sreetama

;

Groven, Benjamin

;

;

Afanas'ev, V. V.

Journal

NANO EXPRESS

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323 since deposited on 2021-11-02

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Acq. date: 2026-08-18

1673 since deposited on 2021-11-02

Acq. date: 2026-08-18