Publication:

Extending gate dielectric scaling by using ALD HfO2/SrTiO3 stacks

Date

2010
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Author(s)

Maes, Jan  
;
Machkaoutsan, Vladimir  
;
Pierreux, Dieter  
;
Blomberg, Tom
;
Swerts, Johan  
;
Schram, Tom  
;
Adelmann, Christoph  
;
Delabie, Annelies  
;
Van Elshocht, Sven  
;
Popovici, Mihaela Ioana  
;
Conard, Thierry  
;
Tseng, Joshua
;
Ragnarsson, Lars-Ake  

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