Publication:

Scalability and reliability of TaN/HfN/HfO2 gate stack fabricated by a high temperature process

Date

Loading...
Thumbnail Image

Abstract

Description

Statistics

Views

1980 since deposited on 2021-10-16
1last month
Acq. date: 2026-05-29

Citations

Statistics

Views

1980 since deposited on 2021-10-16
1last month
Acq. date: 2026-05-29

Citations