Publication:

The influence of defects on campatibility and yield of the HfO2-polysilicon gate stack for CMOS integration

Date

2003
Proceedings Paper
Simple item page Full metadata Statistics
Loading...
Thumbnail Image

Files

7231.pdf 479.63 KB

Author(s)

Kaushik, Vidya
;
De Gendt, Stefan  
;
Carter, Richard
;
Claes, Martine  
;
Röhr, Erika
;
Pantisano, Luigi
;
Kluth, Jon
;
Kerber, Andreas
;
Cosnier, Vincent
;
Cartier, Eduard
;
Tsai, Wilman
;
Young, Edward
;
Green, Martin
;
Chen, Jerry
;
Jang, S.A.
;
Lin, S.
;
Delabie, Annelies  
;
Van Elshocht, Sven  
;
Manabe, Yukiko
;
Richard, Olivier  
;
Zhao, Chao
;
Bender, Hugo  
;
Caymax, Matty  
;
Heyns, Marc  

Journal

Abstract

Description

Statistics

Views

1911 since deposited on 2021-10-15
2last month
Acq. date: 2026-08-18

Citations

Statistics

Views

1911 since deposited on 2021-10-15
2last month
Acq. date: 2026-08-18

Citations