Publication:

Influence of the process sequence and termal budget on the strain of SiC stressor layers formed by ion implantation

Date

2010
Proceedings Paper
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Author(s)

Rosseel, Erik  
;
Ortolland, Claude
;
Hikavyy, Andriy  
;
Schram, Tom  
;
Falepin, Annelies  
;
Hoffmann, Thomas Y.
;
Douhard, Bastien  
;
Moussa, Alain  
;
Vandervorst, Wilfried  
;
Ameen, Mike
;
Rubin, Leonard

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1 since deposited on 2021-10-18
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1930 since deposited on 2021-10-18
Acq. date: 2026-05-30

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