Publication:

Dielectric quality and reliability of FUSI/HfSiON devices with process induced strain

Date

2007

Journal article

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Files

14184.pdf 244.05 KB

Author(s)

Shickova, Adelina

;

;

;

Verheyen, Peter

;

;

;

Absil, Philippe

;

;

Groeseneken, Guido

Journal

Microelectronic Engineering

Statistics

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