Publication:

High-NA EUV Optical Proximity Correction Modeling Flow: from Data Preparation to Model Validation

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3072706
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Author(s)

Wei, Chih-, I
;
Chen, Chao-Heng
;
Thakare, Devesh
;
Levinson, Zachary
;
Nge, Philip C. W.
;
Schatz, Jirka
;
Welling, Ulrich
;
Dawes, Andrew M. C.
;
Hopped, Wolfgang
;
Demmerle, Wolfgang
;
Liu, Ting-Chun
;
Preuninger, Juergen
;
Yu, Zhiru
;
Klosterman, Ulrich
;
Hwang, Soobin  
;
Kareem, Pervaiz  
;
Gillijns, Werner  

Journal

PHOTOMASK TECHNOLOGY 2025

Abstract

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10 since deposited on 2026-03-31
5last month
3last week
Acq. date: 2026-08-16

Citations