Publication:

Contribution of mask roughness in stochasticity of high-NA EUV imaging

Date

2021
Proceedings Paper
https://doi.org/10.1117/12.2601897
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euvl2021_11854-50_Jonckheere_fin2.pdf 1.8 MB

Author(s)

Jonckheere, Rik  
;
Melvin, Lawrence, III

Journal

SPIE proceedings

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872 since deposited on 2022-05-22
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1675 since deposited on 2022-05-22
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