Publication:

Influence of trench width on III-V nucleation during InP selective area growth on patterned Si(001) substrates

Date

2014
Proceedings Paper
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Author(s)

Jiang, Sijia
;
Merckling, Clement  
;
Moussa, Alain  
;
Guo, Weiming
;
Waldron, Niamh  
;
Collaert, Nadine  
;
Barla, Kathy  
;
Caymax, Matty  
;
Vandervorst, Wilfried  
;
Seefeldt, Marc
;
Heyns, Marc  

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