Publication:

Evolution of lithography-to-etch bias in multi-patterning processes

Date

2022
Journal article
https://doi.org/10.1116/6.0002059
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Published version 8.62 MB

Author(s)

Panneerchelvam, Prem
;
Agarwal, Ankur
;
Huard, Chad M. M.
;
Pret, Alessandro Vaglio
;
Mani, Antonio
;
Gronheid, Roel
;
Demand, Marc
;
Kumar, Kaushik
;
Paolillo, Sara  
;
Lazzarino, Frederic  

Journal

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

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168 since deposited on 2022-10-09
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1618 since deposited on 2022-10-09
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