Publication:

Process, design and optical proximity correction requirements for the 65nm device generation

Date

2003
Proceedings Paper
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Author(s)

Lucas, Kevin
;
Montgomery, Patrick
;
Litt, Lloyd C.
;
Conley, Will
;
Postnikov, Sergei V.
;
Wu, Wei
;
Yuan, Chi-Min
;
Olivares, Marc
;
Strozewski, Kirk
;
Carter, Russell L.
;
Vasek, James
;
Smith, David
;
Fanucchi, Eric L.
;
Wiaux, Vincent  
;
Vandenberghe, Geert  
;
Toublan, Olivier
;
Verhappen, Arjan
;
Kuijten, Jan P.
;
van Wingerden, Johannes
;
Kasprowicz, Bryan S.
;
Tracy, Jeffrey W.
;
Progler, Christopher J.
;
Shiro, Eugene
;
Topouzov, Igor
;
Wimmer, Karl
;
Roman, Bernard J.

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