Publication:

Selective epitaxial Si/SiGe growth for VT shift adjustment in high k pMOS devices

Date

2007

Journal article

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Files

15035.pdf 126.76 KB

Author(s)

;

Sorada, Haruyuki

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;

;

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Jakschik, Stefan

;

Lujan, Guilherme

;

Hoffmann, Thomas Y.

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Journal

Semiconductor Science and Technology

Statistics

1884 since deposited on 2021-10-16

3last month

Acq. date: 2026-06-04