Publication:

EUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2614000
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Published version 1.9 MB

Author(s)

Tan, Ling Ee  
;
Gillijns, Werner  
;
Lee, Jae Uk  
;
Xu, Dongbo  
;
Van de Kerkhove, Jeroen  
;
Philipsen, Vicky  
;
Kim, Ryan Ryoung Han  

Journal

Proceedings of SPIE

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1199 since deposited on 2022-09-19
64last month
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Acq. date: 2026-10-13

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1542 since deposited on 2022-09-19
2last month
2last week
Acq. date: 2026-10-13

Citations