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Simulation of Ar/Cl2/O2 inductively coupled plasmas used for anisotropic etching of silicon
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1858 since deposited on 2021-10-18
3last month
Acq. date: 2026-06-03
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Views
1858 since deposited on 2021-10-18
3last month
Acq. date: 2026-06-03
Citations