Publication:

Optical proximity correction for 0.3 μm i-line lithography

Date

1996
Journal article
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Author(s)

Yen, Anthony
;
Tzviatkov, Plamen
;
Wong, Alfred
;
Juffermans, Casper
;
Jonckheere, Rik  
;
Jaenen, Patrick  
;
Garofalo, J.
;
Otto, O.
;
Ronse, Kurt  
;
Van den hove, Luc  

Journal

Microelectronic Engineering

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