Publication:

Low-frequency noise behavior of SiO2-HfO2 dual-layer gate dielectric nMOSFETs with different interfacial oxide thickness

Date

Loading...
Thumbnail Image

Journal

Abstract

Description

Statistics

Views

1937 since deposited on 2021-10-15
2last month
1last week
Acq. date: 2026-10-13

Citations

Statistics

Views

1937 since deposited on 2021-10-15
2last month
1last week
Acq. date: 2026-10-13

Citations