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Atomic Hydrogen Exposure to Enable High-Quality Low-Temperature SiO2 with Excellent pMOS NBTI Reliability Compatible with 3D Sequential Tier Stacking

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623 since deposited on 2021-12-06
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Acq. date: 2026-06-01

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2095 since deposited on 2021-12-06
Acq. date: 2026-06-01

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623 since deposited on 2021-12-06
47last month
Acq. date: 2026-06-01

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2095 since deposited on 2021-12-06
Acq. date: 2026-06-01

Citations