Publication:
A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond
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1921 since deposited on 2021-10-16
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Acq. date: 2026-08-18
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Statistics
Views
1921 since deposited on 2021-10-16
3last month
3last week
Acq. date: 2026-08-18
Citations