Publication:

O2 post deposition anneal of Al2O3 blocking dielectric for higher performance and reliability of TANOS flash memory

Date

2009

Proceedings Paper

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Files

18375.pdf 863.08 KB

Author(s)

Rothschild, Aude

;

Breuil, Laurent

;

Van den Bosch, Geert

;

Richard, Olivier

;

Conard, Thierry

;

Franquet, Alexis

;

Cacciato, Antonio

;

Debusschere, Ingrid

;

;

;

;

Ganguly, Udayan

;

;

;

Schreutelkamp, Rob

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2096 since deposited on 2021-10-18

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Acq. date: 2026-10-13