Publication:

ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes

Date

1999
Proceedings Paper
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Author(s)

Mulkens, J.
;
Stoeldraijer, J.
;
Davies, G.
;
Dierichs, M.
;
Heskamp, B.
;
Moers, M. H.
;
George, R. A.
;
Roempp, O.
;
Glatzel, H.
;
Wagner, C.
;
Pollers, Ingrid
;
Jaenen, Patrick  

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