Publication:
Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
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468 since deposited on 2024-08-05
47last month
8last week
Acq. date: 2026-08-17
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632 since deposited on 2024-08-05
2last month
Acq. date: 2026-08-17
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