Publication:
Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
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396 since deposited on 2024-08-05
Acq. date: 2026-06-01
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630 since deposited on 2024-08-05
Acq. date: 2026-06-01
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Downloads
396 since deposited on 2024-08-05
Acq. date: 2026-06-01
Views
630 since deposited on 2024-08-05
Acq. date: 2026-06-01
Citations