Publication:

Double dipole lithography for 65-nm node and beyond: a technology readiness review

Date

2004

Proceedings Paper

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Files

9987.pdf 3.54 MB

Author(s)

;

;

Hendrickx, Eric

;

Van Den Broeke, Douglas J.

;

Chiou, Tsann-Bim

;

;

Laidig, Thomas L.

;

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Statistics

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Acq. date: 2026-08-16