Alternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33

Kovalevich, Tatiana; Pellens, Nick; Libeert, Guillaume; Van Look, Lieve; Frommhold, Andreas; Philipsen, Vicky; Abe, Tsukasa; Fujimura, Yukihiro; Hotei, Izumi; Ebisawa, Mei; Yamaji, Masataka; Tomizuka, Shosuke; Yoshikawa, Shingo

doi:10.1117/12.3071379

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Alternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33

Date

2025

Proceedings Paper

https://doi.org/10.1117/12.3071379

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PHOTOMASK TECHNOLOGY 2025

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Acq. date: 2026-10-13

Alternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33

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