Publication:

Alternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3071379
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Author(s)

Kovalevich, Tatiana  
;
Pellens, Nick  
;
Libeert, Guillaume  
;
Van Look, Lieve  
;
Frommhold, Andreas  
;
Philipsen, Vicky  
;
Abe, Tsukasa
;
Fujimura, Yukihiro
;
Hotei, Izumi
;
Ebisawa, Mei
;
Yamaji, Masataka
;
Tomizuka, Shosuke  
;
Yoshikawa, Shingo

Journal

PHOTOMASK TECHNOLOGY 2025

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7 since deposited on 2026-03-31
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Acq. date: 2026-06-01

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7 since deposited on 2026-03-31
3last month
Acq. date: 2026-06-01

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