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Thin strain relaxed SiGe buffer layers on Si and SOI wafers made by He+ ion implantation and annealing

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1935 since deposited on 2021-10-15
1last month
Acq. date: 2026-06-05

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1935 since deposited on 2021-10-15
1last month
Acq. date: 2026-06-05

Citations