Publication:
High performance Si.45Ge.55 implant free quantum well FET featuring low temperature process, eSiGe stressor and transversal strain relaxation
Date
Loading...
Files
Journal
Abstract
Description
Statistics
Views
1889 since deposited on 2021-10-19
1last month
Acq. date: 2026-08-15
Citations
Statistics
Views
1889 since deposited on 2021-10-19
1last month
Acq. date: 2026-08-15
Citations