Atomic layer deposition of ruthenium thin films from (ethylbenzyl) (1-ethyl-1,4-cyclohexadienyl) Ru: process characteristics, surface chemistry, and film properties

Popovici, Mihaela Ioana; Groven, Benjamin; Marcoen, Kristof; Phung, Quan; Dutta, Shibesh; Swerts, Johan; Meersschaut, Johan; Van den Berg, Jaap; Franquet, Alexis; Moussa, Alain; Vanstreels, Kris; Lagrain, Pieter; Bender, Hugo; Jurczak, Gosia; Van Elshocht, Sven; Delabie, Annelies; Adelmann, Christoph

Publication:

Atomic layer deposition of ruthenium thin films from (ethylbenzyl) (1-ethyl-1,4-cyclohexadienyl) Ru: process characteristics, surface chemistry, and film properties

Date

2017

Journal article

Simple item page Full metadata Statistics

Author(s)

Popovici, Mihaela Ioana

;

;

;

;

;

;

;

;

;

;

;

;

;

;

;

;

Journal

Chemistry of Materials

Statistics

2017 since deposited on 2021-10-24

7last month

1last week

Acq. date: 2026-08-18

Atomic layer deposition of ruthenium thin films from (ethylbenzyl) (1-ethyl-1,4-cyclohexadienyl) Ru: process characteristics, surface chemistry, and film properties

Date

Author(s)

Journal

Abstract

Description

Statistics

Views

Citations

Statistics

Views

Citations