Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align

Franke, Joern-Holger; Frommhold, Andreas; Davydova, Natalia; Aubert, Remko; Nair, Vineet Vijayakrishnan; Kovalevich, Tatiana; Rio, David; Bekaert, Joost; Wang, Erik; Rispens, Gijsbert; Maslow, Mark; Hendrickx, Eric

doi:10.1117/12.2584733

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Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align

Date

2021

Proceedings Paper

https://doi.org/10.1117/12.2584733

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Nair, Vineet Vijayakrishnan

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Proceedings of SPIE

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1899 since deposited on 2022-03-11

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Acq. date: 2026-08-19

Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align

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