Publication:
E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography
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Acq. date: 2026-06-02
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691 since deposited on 2024-04-18
Acq. date: 2026-06-02
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879 since deposited on 2024-04-18
Acq. date: 2026-06-01
Citations