Publication:
Effects of Al2O3 dielectric cap and nitridation on device performance, scalability, and reliability for advanced high-k/metal gate pMOSFET applications
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1913 since deposited on 2021-10-16
3last month
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Acq. date: 2026-08-16
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Statistics
Views
1913 since deposited on 2021-10-16
3last month
1last week
Acq. date: 2026-08-16
Citations