Publication:
Characterization of advanced k1.9, 2.0 and 2.2 ultra-porous SiOC(H) films deposited by plasma-enhanced chemical vapor deposition
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1881 since deposited on 2021-10-22
2last month
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Acq. date: 2026-08-18
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Statistics
Views
1881 since deposited on 2021-10-22
2last month
1last week
Acq. date: 2026-08-18
Citations