EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Cong Que Dinh; Nagahara, Seiji; Yoshida, Keisuke; Kondo, Yoshihiro; Muramatsu, Makoto; Yoshihara, Kosuke; Shimada, Ryo; Moriya, Teruhiko; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert

doi:10.1117/12.2583922

Publication:

EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Date

2021

Proceedings Paper

https://doi.org/10.1117/12.2583922

Simple item page Full metadata Statistics

Author(s)

;

;

;

;

;

;

;

;

;

;

;

;

Journal

Proceedings of SPIE

Statistics

1351 since deposited on 2022-09-08

1last month

Acq. date: 2026-05-31

EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Date

Author(s)

Journal

Abstract

Description

Statistics

Views

Citations

Statistics

Views

Citations