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Fabrication and characterization of SOI multi gate field effect transistors with high-k dielectrics and metal gates

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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtualsource.department03418a24-8ed5-4735-998d-ae4d5f6f994c
cris.virtualsource.orcid03418a24-8ed5-4735-998d-ae4d5f6f994c
dc.contributor.advisorDe Meyer, Kristin
dc.contributor.authorFerain, Isabelle
dc.contributor.thesisadvisorDe Meyer, Kristin
dc.date.accessioned2021-10-17T07:05:19Z
dc.date.available2021-10-17T07:05:19Z
dc.date.embargo9999-12-31
dc.date.issued2008-12
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13719
dc.title

Fabrication and characterization of SOI multi gate field effect transistors with high-k dielectrics and metal gates

dc.typePHD thesis
dspace.entity.typePublication
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