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Fabrication of porogen residue free ultra low-k PECVD material by subsequent H2-afterglow plasma treatment and UV curing
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1947 since deposited on 2021-10-18
3last month
Acq. date: 2026-08-15
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Statistics
Views
1947 since deposited on 2021-10-18
3last month
Acq. date: 2026-08-15
Citations