Publication:
Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration
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Acq. date: 2026-10-12
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470 since deposited on 2021-11-02
42last month
16last week
Acq. date: 2026-10-12
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1941 since deposited on 2021-11-02
Acq. date: 2026-10-12
Citations