Publication:

Enabling CD SEM metrology for 5nm technology node and beyond

Date

2017
Proceedings Paper
https://doi.org/10.1117/12.2257468
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37296.pdf 2.11 MB

Author(s)

Lorusso, Gian  
;
Ohashi, Takeyoshi
;
Yamaguchi, Astuko
;
Inoue, Osamu
;
Sutani, Takumichi
;
Horiguchi, Naoto  
;
Boemmels, Juergen  
;
Wilson, Chris  
;
Briggs, Basoene  
;
Tan, Chi Lim
;
Raymaekers, Tom
;
Delhougne, Romain  
;
Van den Bosch, Geert  
;
Di Piazza, Luca  
;
Kar, Gouri Sankar  
;
Furnemont, Arnaud  
;
Fantini, Andrea  
;
Donadio, Gabriele Luca  
;
Souriau, Laurent  
;
Crotti, Davide  
;
Yasin, Farrukh  
;
Appeltans, Raf  
;
Rao, Siddharth  
;
De Simone, Danilo  
;
Rincon Delgadillo, Paulina  
;
Leray, Philippe  
;
Charley, Anne-Laure  
;
Zhou, Daisy  
;
Veloso, Anabela  
;
Collaert, Nadine  
;
Hasumi, Kazuhisa
;
Koshihara, Shunsuke
;
Ikota, Masami
;
Okagawa, Yutaka
;
Ishimoto, Toru

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