Need for LWR metrology standardization: the imec roughness protocol

Lorusso, Gian; Sutani, Takeyoshi; Rutigliani, Vito; Van Roey, Frieda; Moussa, Alan; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Perera, Chami; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, Shunshuke

doi:10.1117/1.JMM.17.4.041009

Publication:

Need for LWR metrology standardization: the imec roughness protocol

Date

2018

Journal article

https://doi.org/10.1117/1.JMM.17.4.041009

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Author(s)

Lorusso, Gian

;

Sutani, Takeyoshi

;

Rutigliani, Vito

;

Van Roey, Frieda

;

Moussa, Alan

;

Charley, Anne-Laure

;

Mack, Chris

;

Naulleau, Patrick

;

Perera, Chami

;

Constantoudis, Vassilios

;

Ikota, Masami

;

Ishimoto, Toru

;

Koshihara, Shunshuke

Journal

Journal of Micro/Nanolithography MEMS and MOEMS

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1993 since deposited on 2021-10-25

Acq. date: 2026-06-03

Need for LWR metrology standardization: the imec roughness protocol

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