Publication:
Atomic layer deposition process of Hf-based high-k gate dielectric film on Si substrate
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1971 since deposited on 2021-10-20
1last month
Acq. date: 2026-08-16
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Statistics
Views
1971 since deposited on 2021-10-20
1last month
Acq. date: 2026-08-16
Citations