Publication:

Ultra-low damage integration of k= 2.3 periodic mesoporous oxide dielectric material using cryogenic etching

Date

2014

Meeting abstract

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Author(s)

de Marneffe, Jean-Francois

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;

Krishtab, Mikhail

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;

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;

;

Wen, Liang Gong

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;

Matsunaga, Koichi

;

Nafus, Kathleen

;

Boemmels, Juergen

;

;

Baklanov, Mikhaïl

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1951 since deposited on 2021-10-22

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Acq. date: 2026-08-18