Browsing by Author "Pellens, Nick"

Alternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33

An experimental stitching study on the eve of High NA EUV

At-resolution stitching with high-reflectivity low-n masks

Comparing bright field imaging performance at 0.33 NA of a novel low-reflectivity low-n and a standard Ta-based EUV mask

Experimental imaging comparison at 0.55 NA of a low-reflectivity low-n mask to a standard Ta-based EUV mask

High NA EUV single patterning of advanced metal logic nodes: Inverse lithography techniques in combination with alternative mask absorbers

Imaging roadmap for high-NA EUV: Paving the way to single-patterning of metal logic for future nodes

Increasing throughput in EUV logic applications with thinner low-n masks and wavefront optimization

Mask innovations on the eve of high NA EUV lithography

Methodology of Stitching Evaluation at NA 0.33 to enable high-NA assessment

On the use of illumination-source pixels in the central-obscuration area for enhancing the process window of contact printing with high-NA EUV lithography

Printing verification of the improved performance of low-n mask with Sub-Resolution Grating (SRG) in High-NA EUVL

Probing the role of substrate chemistry and interface interactions on MoS2

Stitching for High NA: zooming in on CDU budget

Stitching insights towards high numerical aperture extreme ultraviolet lithography: an experimental study

The performance evaluation of at-resolution stitching on NXE