Browsing by Author "Libeert, Guillaume"

Alternative EUV multilayer mirror mask for reduced mask 3D effects evaluated at NA0.33

An experimental stitching study on the eve of High NA EUV

Au-3-Decorated graphene as a sensing platform for O-2 adsorption and desorption kinetics

Comparing bright field imaging performance at 0.33 NA of a novel low-reflectivity low-n and a standard Ta-based EUV mask

Depth-of-Focus enhancement in High-Numerical Aperture EUV lithography by source and mask optimization

Depth-of-focus enhancement in high-numerical aperture EUV lithography by source and mask optimization

Experimental imaging comparison at 0.55 NA of a low-reflectivity low-n mask to a standard Ta-based EUV mask

High-NA EUV Mask CD-SEM Metrology Matching, and Contour-based Comparison of Simulation Result and Wafer Print

Imaging roadmap for high-NA EUV: Paving the way to single-patterning of metal logic for future nodes

Magnetic clusters as efficient EY-like spin-scattering centres in graphene

Mask innovations on the eve of high NA EUV lithography

Printing verification of the improved performance of low-n mask with Sub-Resolution Grating (SRG) in High-NA EUVL

Stitching insights towards high numerical aperture extreme ultraviolet lithography: an experimental study

Tuning the spintronic properties of graphene with atomically precise Au clusters