Browsing by Author "Levinson, Zachary"

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Characterization of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images

Raghunathan, Sudhar
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Wood, Obert
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Mangat, Pawitter
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Verduijn, Erik
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Philipsen, Vicky
Journal article
2014, Journal of Vacuum Science and Technology B, (32) 6, p.06F801
Co-Optimized Double-Exposure Stitching with ILT to Maximize High-NA EUV Process Window

Dam, Thuc
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Painter, Benjamin
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Taneja, Ankur
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Selinidis, Kosta
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Abdelghany, Hesham
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Zhou, Xiangyu
Proceedings paper
2026, DTCO and Computational Patterning V, 2026-02-22, p.139800G
High-NA EUV Optical Proximity Correction Modeling Flow: from Data Preparation to Model Validation

Wei, Chih-, I
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Chen, Chao-Heng
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Thakare, Devesh
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Levinson, Zachary
;
Nge, Philip C. W.
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Schatz, Jirka
Proceedings paper
2025, Photomask Technology, 2025-06-04, p.136870Q
Machine Learning Enhanced Optical Proximity Correction Modeling for High-NA EUV Lithography

Wei, Chih-I
;
Levinson, Zachary
;
Ng, Philip C. W.
;
Lin, Cheng-Huei
;
Chen, Ming-Yun
;
Demmerle, Wolfgang
Proceedings paper
2026, DTCO and Computational Patterning V, 2026-02-22, p.139800C