Development of 1.6 μm Fine- Pitch RDL Damascene Process using Low-NA i-Line Stepper and a New Negative-tone Photosensitive Dielectric Material

Wang, Lili; Pak, Murat; Inoue, Go; Shibasaki, Kaho; Okuda, Ayano; Sugita, Kenyu; Ishikawa, Nobuhiro; Ogata, Toshiyuki; Miller, Andy; Beyne, Eric

doi:10.1109/icsj66986.2025.11302593

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