Browsing by Author "Zhang, Xima"
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Publication Monotonic Machine Learning (MML) for Curvilinear OPC Retargeting in NA0.33 EUV Single-Patterning 28nm Metal Pitch Curvilinear Logic Technology
Proceedings paper2026, Optical and EUV Nanolithography XXXIX, 2026-02-22, p.1397926Publication OPC and Modeling Solution towards 0.55NA EUV Stitching
Proceedings paper2024, Optical and EUV Nanolithography XXXVII, 2024-02-25, p.129530KPublication Optimizing EUV OPC Runtime and Pattern Fidelity in DRAM Manufacturing Using Memory OPC Flow
Proceedings paper2025, 2025 Conference on Novel Patterning Technologies, 2025-04-25, p.134270Y-1-134270Y-6