Browsing by Author "Slachter, Bram"
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Publication Focus sensitivity of CD extreme values demonstrated on a 40 nm pitch DRAM hexagonal contact hole use case printed with 0.33 NA EUV lithography
Proceedings paper2026, Metrology, Inspection, and Process Control XL, 2026-02-22, p.1398131Publication Impact of local variability on defect-aware process windows
Proceedings paper2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109570HPublication Stitching for High NA: zooming in on CDU budget
Proceedings paper2023, International Conference on Extreme Ultraviolet Lithography, OCT 02-05, 2023, p.Art. 1275002