Browsing by Author "Leitao, Sofia"
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Publication 2D inner assist features for 0.55NA: mask wafer data characterization
Proceedings paper2025, Photomask Technology, 2025-09-22, p.136871IPublication Benefits of using advanced sub-resolution features for 0.55NA brightfield imaging
Proceedings paper2024, 2024 International Conference on Extreme Ultraviolet Lithography, 2024-09-29Publication Depth-of-Focus enhancement in High-Numerical Aperture EUV lithography by source and mask optimization
Proceedings paper2025, PHOTOMASK TECHNOLOGY 2025, 2025-09-22, p.136870PPublication Depth-of-focus enhancement in high-numerical aperture EUV lithography by source and mask optimization
Journal article2026, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (25) 2, p.021208-021208